XRD analysis of nanosized silicon derived from broken glassware
Abstract
Recently silicon (Si) nanomaterial has drawn substantial interest owing to its versatility in chemical, and physical characteristics. The reduced size, and high surface area, unlike the bulk Si, has made it appropriate for diverse applications. There are numerous sources reported so far responsible for the production of nanostructured Si. However, the advantage of using broken glassware is that it doesn’t require to undergo any purification process such as pre-heating or pre-acid leaching. Herein, we describe the synthesis of silicon nanomaterial from broken glassware collected from the laboratory employing the magnesiothermic reduction method. To explore the structure-property relationship, X-ray diffraction (XRD) patterns act as the fingerprint of the material. XRD study has been performed to qualitatively and quantitatively analyze the synthesized nanomaterial. From the qualitative analysis, the diffraction pattern observed after heat treatment has exhibited the formation of Si along with magnesium oxide (MgO) and magnesium silicate (Mg2SiO4). Whereas after the subsequent HCl and HF leaching, peaks for only Si have been observed. Incorporating Scherrer’s Equation on the intense (111) plane, the crystallite size of Si has been estimated to be 49 nm. Using Rietveld analysis, the weight percentage of Si has been found to increase gradually with each treatment step.
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